10078995-G02-10ULF Minitek 2mm Header 10-Pos
MPN10078995-G02-10ULF
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FCI (Amphenol) Minitek® 2.00mm 10078995-G02-10ULF, 10-position dual-row male pin header, 2.00mm pitch, surface-mount termination, shrouded 4-wall with keying slot and latch lock/eject hooks, gold GXT™ 30.0µin (0.76µm) on mating side, tin post, rated 2A per circuit at 200V (AC/DC), UL94 V-0 cream thermoplastic housing, 0.244" (6.20mm) insulation height.
$0.8840Ref. price · indicative, final on quote
Source DocumentedChannel stated on listing & quote
Condition PhotosReal unit photos / video on request
WhatsApp AnswersFast human replies for stock & sourcing questions
Worldwide DispatchDHL/FedEx — transit quoted per order
Independent supplier — new & surplus connector stock· Listing updated Jul 2026
Specifications
| Parameter | Value |
|---|---|
| Series | Minitek® 2.00mm |
| Type | Male Pin |
| Mounting | Surface Mount |
| Connector type | Header |
| Fastening type | Latch Lock/Eject Hooks |
| Voltage rating | 200V (AC/DC) |
| Current rating | 2A (AC/DC) |
| Contact material | Copper Alloy |
| Insulation color | Cream |
| Insulation height | 0.244\" (6.20mm) |
| Insulation material | Thermoplastic |
| Material flammability rating | UL94 V-0 |
All specifications
| Parameter | Value |
|---|---|
| Style | Board to Cable/Wire |
| Package | Tube |
| Features | Keying Slot |
| Shrouding | Shrouded - 4 Wall |
| Termination | Solder |
| Contact shape | Square |
| Rows | 2 |
| Pitch | 0.079\" (2.00mm) |
| Positions | 10 |
| Row spacing - mating | 0.079\" (2.00mm) |
| Contact finish - post | Tin |
| Contact finish - mating | Gold, GXT™ |
| Contact length - mating | 0.157\" (4.00mm) |
| Contact finish thickness - mating | 30.0µin (0.76µm) |
Frequently asked questions
What connector mates with the 10078995-G02-10ULF header?
The 10078995-G02-10ULF mates with the matching Minitek® 2.00mm dual-row female receptacle housing — confirm the housing order code matches the 10-position dual-row footprint and that it accepts the latch/eject hook locking feature for positive retention.